Kato Kinya | Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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概要
- 同名の論文著者
- Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporationの論文著者
関連著者
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Kato Kinya
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Kato Kinya
Ntt Interdisciplinary Research Laboratories
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Kato Kinya
Musashino Electrical Communication Laboratory
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TANAKA Keiji
NTT Integrated Information & Energy Systems Laboratories
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Kato Kinya
Ntt Integrated Information Amp Energy Systems Laboratories
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Wada Tsutomu
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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SUYAMA Shiro
NTT Cyber Space Laboratories, NTT Corporation
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Wada T
Department Of Materials Chemistry Ryukoku University
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Wada Takao
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Wada T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Wada T
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Suyama Shiro
Ntt Cyber Space Laboratories Ntt Corporation
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Suyama Shiro
Ntt Affiliated Business Development Headquarters
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Uehira Kazutake
NTT Interdisciplinary Research Laboratories
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Uehira Kazutake
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Wada Tsutomu
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Uehira K
Ntt Interdisciplinary Research Laboratories
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Suyama S
Ntt Cyber Space Laboratories Ntt Corporation
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SHUTO Keizo
Musashino Electrical Communication Laboratory
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HASEGAWA Masahiko
Musashino Electrical Communication Laboratory
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YAMAUCHI Noriyoshi
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Yamauchi Noriyoshi
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Tanaka Keiji
Ntt Interdisciplinary Research Laboratories
著作論文
- Sputtered Lead Silicate Glass Film for Multilevel Interconnections : A-5: PROCESS TECHNOLOGY
- Optimum B^+ Dose in S/D Regions to Improve Schottky p-Channel MOSFET Characteristics
- Improvement of Schottky MOSFET Characteristics by B^+ Implantation in Active Region
- Field-Induction-Drain Thin-Film Transistors for Liquid-Crystal Display Applications : Liquid Crystal Display
- Field-Induction-Drain Thin-Film Transistors for Liquid-Crystal Display Applications
- Characteristics of Field-Induction-Drain (FID) Amorphous-Silicon Thin-Film Transistors
- Observation of Ferroelectricity in Very Thin Vinylidene Fluoride Trifluoroethylene Copolymer[P(VDF・TrFE)] Films by High Frequency C-V Measurements of Al-SiO_2-P(VDF・TrFE)-SiO_2-Si Capacitors