Internal Stress and Microstructure of WN_x Bilayer Films for X-Ray Masks

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-12-30

著者

• AHN Jinho

  Hanyang University, Department of Materials Science and Engineering

• Ahn Jinho

  Hanyang University

• Song Ki-chang

  Lg Corporate Institute Of Technology

• Lee Don-hee

  Lg Corporate Institute Of Technology

• Lee Tae

  Hanyang University

• PARK Chil-Keun

  LG Corporate Institute of Technology

• JEON Young-Sam

  LG Corporate Institute of Technology

• JEONG Chang

  Hanyang University

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• Work function tunability of bilayer metal gate electrode (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
• Current and future program of EUVL in Korea
• Current and future program of EUVL in Korea
• Internal Stress and Microstructure of WN_x Bilayer Films for X-Ray Masks
• Resistance Switching of HfO_2 Film and Its Application to Non-Volatile Memory
• Internal Stress and Microstructure of WNx Bilayer Films for X-Ray Masks

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