Resistance Switching of HfO_2 Film and Its Application to Non-Volatile Memory
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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PARK In-Sung
Hanyang University, Information Display Research Institute
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AHN Jinho
Hanyang University, Department of Materials Science and Engineering
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Ahn Jinho
Hanyang University
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Ahn Jinho
Hanyang University Department Of Advanced Materials Science And Engineering
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Park In-sung
Hanyang University Information Display Research Institute
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Jung Keum
Hanyang University Department Of Advanced Materials Science And Engineering
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LEE Jooho
Hanyang University, Department of Advanced Materials Science and Engineering
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PARK Jungho
Hanyang University, Department of Advanced Materials Science and Engineering
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LEE Sunwoo
Hanyang University, Department of Advanced Materials Science and Engineering
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Lee Jooho
Hanyang University Department Of Advanced Materials Science And Engineering
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Lee Sunwoo
Hanyang University Department Of Advanced Materials Science And Engineering
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Park Jungho
Hanyang University Department Of Advanced Materials Science And Engineering
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- Internal Stress and Microstructure of WN_x Bilayer Films for X-Ray Masks
- Resistance Switching of HfO_2 Film and Its Application to Non-Volatile Memory
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