Internal Stress and Microstructure of WNx Bilayer Films for X-Ray Masks

概要

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In order to obtain the low-stress absorber for the X-ray mask, we have investigated the internal stress and the microstructures of WN x bilayer films with the structure of amorphous/crystalline phases. WN x film goes through a transition from an amorphous phase to a crystalline phase as the N2 content in the working gas increases. WN x bilayer film was prepared by two-step sputtering with varying N2 content of 10% for the crystalline phase and 5% for the amorphous phase. Precise stress control of the film was carried out by step annealing in a N2 atmosphere. We could obtain the internal film stress of less than 10 MPa by step annealing. The WN x bilayer film exhibits a very smooth surface with roughness of less than 1 nm and a long term stress stability less than of 2 MPa in air.
INSTITUTE OF PURE AND APPLIED PHYSICSの論文
1997-12-30