Formation of Si(111)-6×6 -Au Structure without Using a Vacuum Evaporation Technique Observed by Reflection High-Energy Electron Diffraction
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概要
- 論文の詳細を見る
We have demonstrated the formation of the Si(111) -6×6 -Au surface structure without using a vacuum evaporation technique. Au multiply-twinned particle micelles, comprised of a Au multiply-twinned particle and mer-captopropionic acid, in water were put on a thermally oxidized Si(Ill) substrate. After drying and introduction into a vacuum chamber, the Si(111) substrate was flashed at 900℃. Then the 6×6 surface structure was observed by reflection high-energy electron diffraction. A novel technique for metal deposition at a coverage of several monolayers or at sub-monolayer coverage can be predicted from the result.
- 社団法人応用物理学会の論文
- 1997-06-15
著者
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INO Shozo
Department of Physics, Faculty of Science, University of Tokyo
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Ino Shozo
Department Of Physics Faculty Of Science University Of Tokyo
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Ino Shozo
Department Of Physics Graduate School Of Science University Of Tokyo:(present Address)faculty Of Eng
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TAKAMI Tomohide
Department of Physics, Graduate School of Science, University of Tokyo
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Takami Tomohide
Department Of Physics Graduate School Of Science University Of Tokyo
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