Preparation and Properties of ZrF_4-Based Fluoride Glass Films by Plasma-Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
ZrF_4-based binary glass films are for the first time synthesized by plasma-enhanced chemical vapor deposition (PCVD) and their optical transmission spectrum is measured from the UV to near IR region. The films are pore-free and transparent. No absorption band caused by OH or other impurities can be observed in the near IR region. Weak absorption bands attributed to defect centers, which are induced by plasma bombardment, are observed in the UV to visible region.
- 社団法人応用物理学会の論文
- 1991-08-15
著者
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Takahashi Sumio
Department Of Applied Physics The National Defense Academy
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NISHIDA Yoshiki
NTT Photonics Laboratories, NTT Corporation
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Takahashi S
Department Of Applied Physics National Defense Academy
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TAKAHASHI Shiro
NTT Opto-Electronics Laboratories, Nippon Telegraph and Telephone Corporation
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KOBAYASHI Kenji
NTT Opto-Electronics Laboratories
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FUJIURA Kazuo
NTT Opto-Electronics Laboratories
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Nishida Y
Ntt Photonics Laboratories Ntt Corporation
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NISHIDA Yoshiki
NTT Opto-Electronics Laboratories
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Takahashi Shiro
Ntt Opto-electronics Labolatories
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