Direct Observation of Species Liberated from GaAs Native Oxides during Atomic Hydrogen Cleaning
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-05-01
著者
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Yamada Masamichi
Optoelectronics Technology Research Laboratory
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Yamada Masamichi
Optoelectronics Technology Research Laboratory (otl)
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IDE Yuichi
Optoelectronics Technology Research Laboratory
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Ide Yuichi
Optoelectronics Technology Research Laboratory (otl)
-
Ide Yuichi
Optoelectronic's Technology Research Laboratory (otl)
-
Yamada Masamichi
Optoelectronic's Technology Research Laboratory (otl)
関連論文
- Surface Cleaning of Si-Doped/Undoped GaAs Substrates
- Real-Time Observations on the Cleaning Process of Patterned GaAs Substrates
- Characterization of GaAs-(001) Surface Photo-Oxide Formed by Visible-Light Irradiation
- Effect of Atomic Hydrogen on GaAs (001) Surface Oxide Studied by Temperature-Programmed Desorption
- Characterization of Oxidized GaAs (001) Surfaces Using Temperature Programed Desorption and X-Ray Photoelectron Speetroscopy
- Direct Observation of Species Liberated from GaAs Native Oxides during Atomic Hydrogen Cleaning
- Analysis of GaAs MOMBE Reactions by Mass Spectrometry
- GaOH : Unstable Species Liberated from GaAs Surface Oxides during Atomic Hydrogen Cleaning
- Effects of Electron Beam Irradiation and Subsequent Cl_2 Exposure on Photo-Oxidized c(4×4) GaAs : Mechanism of In Situ EB Lithographic Patterning