Yamada Masamichi | Optoelectronics Technology Research Laboratory
スポンサーリンク
概要
関連著者
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Yamada Masamichi
Optoelectronics Technology Research Laboratory
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Yamada Masamichi
Optoelectronic's Technology Research Laboratory (otl)
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Yamada M
Ibaraki Univ. Ibaraki Jpn
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Yamada M
Process Development Division Fujitsu Ltd.
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Yamada M
Sony Corp. Tokyo Jpn
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IDE Yuichi
Optoelectronics Technology Research Laboratory
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Ide Yuichi
Optoelectronic's Technology Research Laboratory (otl)
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TONE Kiyoshi
Optoelectronics Technology Research Laboratory
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Ide Y
Research And Development Center Ricoh Company Ltd.
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Tone K
Optoelectronics Technology Research Laboratory:(present Address)tsukuba Research Laboratory Nippon S
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Yamada Masamichi
Optoelectronics Technology Research Laboratory (otl)
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GOTO Shigeo
Optoelectronics Technology Research Laboratory
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NOMURA Yasuhiko
Optoelectronics Technology Research Laboratory
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KATAYAMA Yoshifumi
Optoelectronics Technology Research Laboratory
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Morishita Yoshitaka
Optoelectronics Technology Research Laboratory
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Ide Yuichi
Optoelectronics Technology Research Laboratory (otl)
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Ohki Yoshimasa
Optoelectronics Technology Research Laboratory
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HIRATANI Yuji
Optoelectronics Technology Research Laboratory
著作論文
- Surface Cleaning of Si-Doped/Undoped GaAs Substrates
- Real-Time Observations on the Cleaning Process of Patterned GaAs Substrates
- Characterization of GaAs-(001) Surface Photo-Oxide Formed by Visible-Light Irradiation
- Effect of Atomic Hydrogen on GaAs (001) Surface Oxide Studied by Temperature-Programmed Desorption
- Characterization of Oxidized GaAs (001) Surfaces Using Temperature Programed Desorption and X-Ray Photoelectron Speetroscopy
- Direct Observation of Species Liberated from GaAs Native Oxides during Atomic Hydrogen Cleaning
- Analysis of GaAs MOMBE Reactions by Mass Spectrometry
- GaOH : Unstable Species Liberated from GaAs Surface Oxides during Atomic Hydrogen Cleaning
- Effects of Electron Beam Irradiation and Subsequent Cl_2 Exposure on Photo-Oxidized c(4×4) GaAs : Mechanism of In Situ EB Lithographic Patterning