Geometrical Correction Factor for Resistivity of Semiconductors by the Square Four-Point Probe Method
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概要
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The geometrical correction factor for the resistivity of semiconductors is derived for a system consisting of a square four-point probe array on a rectangular parallelepiped. The van der Pauw method requires the geometrical correction factor for samples with a thickness greater than about 35% of the probe separation. Numerical evaluations are given as a function of the size of the rectangular parallelepiped and the probe configuration.
- 社団法人応用物理学会の論文
- 1986-04-20
著者
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Yamashita Masato
Department Of Electrical Engineering Faculty Of Engineering Nagoya University
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Yamashita Masato
Department Of Electronic Engineering. Ibaraki University
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