Top-Gate Staggered Amorphous Silicon Thin-Film Transistors: Series Resistance and Nitride Thickness Effects
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概要
- 論文の詳細を見る
- 1998-11-15
著者
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Takeuchi Seiji
Hitachi Research Laboratory Of Hitachi Lid.
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Kanicki Jerzy
Center for Display Technology and Manufacturing, Department of Electrical Engineering and Computer S
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Chiang Chun-sung
The University Of Michigan Department Of Electrical Engineering And Computer Science Solid State Ele
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Kanicki Jerzy
The University Of Michigan Department Of Electrical Engineering And Computer Science Solid State Ele
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Kanicki Jerzy
Center For Display Technology And Manufacturing Department Of Electrical Engineering And Computer Sc
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Takeuchi Susumu
Lsi R&d Laboratory Mitsubisi Electric Corporation
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UGAI Yasuhiro
Hosiden and Philips Display Corporation
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YUKAWA Teizo
Hosiden and Philips Display Corporation
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Ugai Y
Hosiden And Philips Display Corp.
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Chiang Chun-sung
Center For Display Technology And Manufacturing Department Of Electrical Engineering And Computer Sc
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MARTIN Sandrine
Center for Display Technology and Manufacturing, Department of Electrical Engineering and Computer S
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TAKEUCHI Shu
Hosiden and Philips Display Corp.
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Yukawa T
Hosiden And Philips Display Corp.
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Ugai Yasuhiro
Hosiden And Philips Display Corp.
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Martin S
Center For Display Technology And Manufacturing Department Of Electrical Engineering And Computer Sc
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YUKAWA Teizo
Hosiden and Philips Display Corp.
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