Amorphous Se_<75>Ge_<25> Resist Profile Simulation of Focused-Ion-Beam Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-04-15
著者
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Chung H‐b
Kwangwoon Univ. Seoul Kor
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CHUNG Hong-Bay
Department of Electronic Materials Eng., Kwangwoon University
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Lee H‐y
National Central Univ. Chung‐li Twn
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LEE Hyun-Yong
Department of Electronic Materials Engineering, Institute of New Technology, Kwangwoon University
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Lee Hyun-yong
Department Of Electronic Materials Engineering And Institute Of New Technology Kwangwoon University
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Chung Hong-bay
Department Of Electronic Materials Eng. Kwangwoon University
関連論文
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- Polarization Dependence of Holographic Grating in Chalcogenide Film
- Sub-0.1 μm Patterning Characteristics of Inorganic Thin Films by Focused-Ion-Beam Lithography
- Amorphous-Si Transmission Gratings Prepared by Ga^+-Focused-Ion-Beam Milling and Their Polarization Characteristics : Instrumentation, Measurement, and Fabrication Technology
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- Thermally and Optically Induced Nanocrystallites in Amorphous ZnSe Thin Films
- Growih and Performance Study of Aluminum-Free InGaAs/GaAs/InGaAsP Strained Quantum-Well Pump Lasers : Optics and Quantum Electronics
- Electrical Switching Studies of Amorphous Ge1Se1Te2 Thin Film for a High-Performance Nonvolatile Phase-Change Memory
- Electrical Erasing of Holographic Grating in Amorphous Chalcogenide Thin Films
- Electrical Characteristics of Ge25Se75 Thin Films by Ag Ion Doping Methods for Resistance Random Access Memory Applications
- Polarization Dependence of Holographic Grating in Chalcogenide Film
- Polarization Dependence of Photoinduced Birefringence in Chalcogenide Thin Film
- Thermally and Optically Induced Nanocrystallites in Amorphous ZnSe Thin Films