Low-Temperature Hole Mobility Anomaly in Compensated P-Channel Metal-Oxide-Semiconductor Field-Effect Transistor
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概要
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An anomalous hole mobility degradation effect at low temperature and low gate overdrive of a compensated p-channel metal-oxide-semiconductor field-effect transistor (PMOSFET) is reported. Measurements are performed with great care, including the temperature calibration of the device and measurement timing control to exclude unwanted self-heating effect. Methods to determine threshold voltage and effective mobility are discussed. The anomalous effect can be explained by the trapping or freezing out of the electrons ionized from donor level at the acceptor site. The additional charged center enhances the Coulomb scattering of conducting holes that are transported in this region.
- 社団法人応用物理学会の論文
- 1995-07-15
著者
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LU Luke
Department of Applied Physics, Chung Cheng Institute of Technology
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HSU Charles
Department of Electrical Engineering, National Tsing-Hua University
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Guo Jyh-chyurn
Electronic Research And Service Organization Industrial Technology Research Institute
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Lu Luke
Department Of Applied Physics Chung Cheng Institute Of Technology
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Hsu Charles
Deparment Of Electrical Engineering National Ching Hua University
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LU Wei-Lee
Department of Applied Physics, Chung Cheng Institute of Technology
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KAO Chin-Hsin
Department of Applied Physics, Chung Cheng Institute of Technology
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GUO Jyh-Chyurn
Electronic Research and Service Organization, Industrial Technology Research Institute
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