The Damage Energy Transfer to Interfacial Oxide by Phosphorus Ion Implantation for Small Geometry Polysilicon to Polysilicon Contact
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-03-15
著者
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Shibata H
Toshiba Corp. Yokohama Jpn
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Shibata Hideki
Semiconductor Device Engineering Laboratory Toshiba Corporation
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HASHIMOTO Kazuhiko
Semiconductor Device Engineering Laboratory, Toshiba Corporation
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Shibata H
Electrotechnical Lab. Ibaraki Jpn
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Hashimoto Kimio
Department Of Electrical Engineering Kyushu University
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Shibata Hiroyuki
Ntt Basic Research Laboratories
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Hashimoto Kazuhiko
Semiconductor Device Engineering Laboratory Toshiba Corporation
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