Effect of Zr/Ti Ratio on Crystal Structure of Thin Lead Zirconate-Titanate Films Prepared by Reactive Sputtering
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概要
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Thin lead zirconate-titanate (PZT) films have been synthesized on MgO(100) using the tripole magnetron sputtering system. This system makes it possible to sputter lead and zirconium-titanium alternately. Lead concentration in the deposited films can be easily adjusted to near stoichiometry through the control of substrate temperature. The c-axis-oriented films with perovskite structure of Morphotropic Phase Boundary composition were obtained at 550℃ via the self-limiting process of lead concentration. The formation process of thin PZT films has been investigated with reference to the observed results of the dependence of the crystal structure on Zr/Ti ratio as well as lead concentration in the films.
- 社団法人応用物理学会の論文
- 1993-09-30
著者
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Fukami Tatsuo
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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MINEMURA Isamu
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University
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Minemura I
Shinshu Univ. Nagano Jpn
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Minemura Isamu
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Fujisawa A
Shinko Electric Industries Co. Ltd.
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Onuma Yoshio
Shinko Electric Industries Co. Ltd.
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FUJISAWA Akira
Shinko Electric Industries Co., Ltd.
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FURIHATA Masahiro
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University
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Furihata Masahiro
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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