Target Erosion Pattern in Planar Magnetron Sputtering
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概要
- 論文の詳細を見る
Two methods for visualizing the target erosion pattern in the planar magnetron sputtering system are described here. The experimental results obtained by one of the new methods reveal that there exists a threshold vertical magnetic field corresponding to the erosion pattern boundaries. The effect of the working pressure and of the cathode potential on the erosion pattern is explained in terms of the mean free path and the initial velocity of the secondary electrons, respectively.
- 社団法人応用物理学会の論文
- 1982-12-20
著者
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Fukami Tatsuo
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Fukami Tatsuo
Department Of Electronics Engineering Faculty Of Engineering Shinshu University
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SAKUMA Toshiyuki
Department of Pathology, Tokai University School of Medicine
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Sakuma Toshiyuki
Department Of Electronic Engineering Faculty Of Engineering Shinshu University
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Sakuma Toshiyuki
Department Of Electronics Engineering Faculty Of Engineering Shinshu University
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SAKUMA Toshiyuki
Department of Electronic Engineering , Faculty of Engineering, Shinshu University
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