Effects of Sputtering Atmosphere Oxygen Pressure on Photocatalytic Phenomena in Anatase Films : Surfaces, Interfaces, and Films
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概要
- 論文の詳細を見る
Thin anatase films were successfully sputter-deposited on a glass substrate at temperatures as low as 200℃. Photocatalytic activities, evaluated through the decomposition of acetic acid under UV irradiation, showed a strong dependence on oxygen pressure during sputtering and were found to have a close relationship with the oxygen vacancy concentration in the films. Possible explanations for the vacancy concentration of films and their photocatalytic activity have been discussed.
- 社団法人応用物理学会の論文
- 2002-07-01
著者
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Fukami Tatsuo
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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NARUOKA Tomohiko
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University
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MOMOSE Tomoaki
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University
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BAMABA Noriaki
Department of Electrical and Electronic Engineering, Faculty of Engineering, Shinshu University
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Momose Tomoaki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Bamaba Noriaki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Naruoka Tomohiko
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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