Stress in Thin Micro-Zone-Molten Crystalline Silicon Films on Solid Substrates

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-07-15

著者

• Mertens P

  Interuniversity Microelectronics Center

• Maes H

  Interuniversitair Micro-electronica Centrum

• MAES Herman

  Interuniversity Microelectronics Center (IMEC)

• MERTENS Paul

  Interuniversitair Micro-Electronica Centrum

• WOERLEE Pierre

  University of Twente

• Maes Herman

  Interuniversitair Micro-electronica Centrum

• Mertens Paul

  Interuniversity Microelectronics Center

関連論文

• Evaluation of a Pre-Objective Scan System for the Laser Recrystallization of Silicon on Insulator Material
• Stress in Thin Micro-Zone-Molten Crystalline Silicon Films on Solid Substrates
• Current-Voltage Characteristics of Gate Oxides after Hard Breakdown
• Morphology Change of Artificial Crystal Originated Particles, and the Effect on Gate Oxide Integrity
• Breakdown and Recovery of Thin Gate Oxides
• Fabrication and Characterization of Artificial Crystal Originated Particles
• Impact of Organic Contamination on Thin Gate Oxide Quality
• H_2O_2 Decomposition and Its Impact on Silicon Surface Roughening and Gate Oxide Integrity

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