Deposition of Tantalum Thin Films by Ion Beam Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1977-07-05
著者
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Naoe Masahiko
Faculty of Engineering, Tokyo Institute of Technology
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Naoe Masahiko
Faculty Of Engineering Tokyo Institute Of Technology
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KAWAI Satoru
Faculty of Engineering, Tokyo Institute of Technology
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Kawai Satoru
Faculty Of Engineering Tokyo Institute Of Technology
関連論文
- Deposition of Ba Ferrite Films for Perpendicular Magnetic Recording Media Using Mixed Sputtering Gas of Xe, Ar and O_2
- Variable Surface Acoustic Wave Delay Line Consisting of a Magnetic Thin Film on a LiNbO_3 Substrate : C-2: SURFACE WAVE AND MAGNETIC DEVICES
- Electrical Properties of Oxygenated Amorphous Si Prepared by Ion-Beam Sputtering
- Sputtered Dielectric Thin Films with High-Refractive-Index for Optical Waveguide
- Deposition of Tantalum Thin Films by Ion Beam Sputtering
- Deposition of Silicon Nitride Films by High Rate Reactive Sputtering : A-1: ADVANCED LITHOGRAPHY AND PROCESS
- High Rate Deposition of Iron Films by Sputtering from Two Facing Tragets
- Control of Soft Magnetism of Co-Zr and Co-Zr-Ta Films for Backlayers in Perpendicular Magnetic Recording Media
- Deposition of Amorphous CoZrNb Films Using CMF Magnetron Sputtering Technique