TiC Single Crystal Preparation by Floating Zone Technique under Low Ambient Gas Pressure
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1976-05-05
著者
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Kumashiro Yukinobu
Electrotechnical Laboratory
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MISAWA Shunji
Electrotechnical Laboratory
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ITO Akio
Electrotechnical Laboratory
関連論文
- Growth of High-Mobility 3C-SiC Epilayers by Chemical Vapor Deposition : Semiconductors and Semiconductor Devices
- Photoluminescence of Unintentionally Doped and N-Doped 3C-SiC Grown by Chemical Vapor Deposition : Semiconductors and Semiconductor Devices
- Temperature Dependence of Electrical Properties of Nitrogen-Doped 3C-Sit
- High-Temperature Operation of Silicon Carbide MOSFET
- Annealing Effects on Al and AN-Si Contacts with 3C-SiC
- Preparation of As-Deposited Bi-Sr-Ca-Cu-O Films with High T_c Superconducting Phase by Metalorganic Chemical Vapor Deposition
- The Origin of Residual Carriers in CVD-Grown 3C-SiC : Semiconductors and Semiconductor Devices
- Effects of Electron Irradiation on Two-Dimensional Electron Gas in AlGaAs/GaAs Heterostructure
- C-V Characteristics of MOS Structures Fabricated of Al-Doped p-Type 3C-SiC Epilayers Grown on Si by Chemical Vapor Deposition
- Observation of Direct Band Gap Properties in Ge_nSi_m Strained-Layer Superlattices
- Influence of Gallium Sources on Impurity Doping in Gas Source MBE GaAs
- Solid State Reaction of Mo on Cubic and Hexagonal SiC
- Some Aspects of ESCA Spectra of Single Crystals and Thin Films of Titanium Carbide
- TiC Single Crystal Preparation by Floating Zone Technique under Low Ambient Gas Pressure
- Photoelectrochemical behavior of p-Type boron phosphide photoelectrode in acidic solution.