On Determination of Gold Trap Concentration in Diffused Silicon pn Junctions
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概要
- 論文の詳細を見る
On diffused silicon pn junctions doped with gold, junction capacitance for very low and high frequencies was analyzed and gold trap concentration was determined by measurement of junction capacitance on the basis of the analysis. It is concluded that the gold trap concentration gives reasonable value, because the gold trap concentration in the diffused diodes quenched after gold diffusion agrees with the gold concentration determined by the tracer analysis with Au^<198>. The values of the gold trap concentration in the diffused diodes quenched after gold diffusion are almost equal to the solubility of the interstitial gold, but they are less for more slowly cooled diodes and the diodes alloyed after gold diffusion.
- 1970-01-05
著者
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Kamei Tatsuya
Hitachi Research Laboratory Hitachi Ltd.
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Kamei Tatsuya
Hitachi Research Laboratory
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Yatsuo Tsutomu
Hitachi Research Laboratory Hitachi Ltd.
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Ogawa Takuzo
Hitachi Research Laboratory Hitachi Ltd.
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Morita Keiichi
Hitachi Work Hitachi Ltd.
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Yatsuo Tsutomu
Hitachi Ltd.
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