Frequency Response of Metal-Insulator-Metal Tunnel Junctions
スポンサーリンク
概要
- 論文の詳細を見る
Time-dependent tunneling currents in response to small input voltages applied to biased metal-insulator-metal tunnel junctions are calculated by means of the linear response theory based on the transfer Hamiltonian model for the direct electron-tunnelings. An exponentially decaying factor exp(-t/τ), where τ is a life time of a Bloch electron caused by scattering, is introduced into the formula for each elementary current due to a single tunneling-transition of an electron. Nevertheless, the terms including such a decaying factor completely cancel each other in the expressions for the main parts of the resultant tunneling-current responses. The time lags of the responses turn out to be much less than τ.
- 社団法人応用物理学会の論文
- 1971-09-05
著者
-
Nagae Moichiro
Department Of Mathematics And Physics The National Defense Academy
-
Nagae Moichiro
Department Of Physics Defense Academy
関連論文
- Linear Responses of Metal-Insulator-Metal Tunnel Junctions to Step Input Voltage
- Frequency Response of Metal-Insulator-Metal Tunnel Junctions
- Theory of Recombination Processes in Semiconductors through Multielectron Centers with Many Excited States
- Coherent Tunneling and Voltage Amplification
- Response Time of Metal-Insulator-Metal Tunnel Junctions
- Note on the Response-Time Limit of Metal-Insulator-Metal Tunnel Junctions
- Effect of Excited Multielectron Centers on the Recombination Processes in Semiconductors