A 1.5-ns Cycle-Time 18-kb Pseudo-Dual-Port RAM with 9K Logic Gates (Special Section on the 1993 VLSI Circuits Symposium (Joint Issue with the IEEE Journal of Solid-State Circuits, Vol.29, No.4 April 1994))
スポンサーリンク
概要
- 論文の詳細を見る
An 18-kb RAM with 9-kgate control logic gates operating during a cycle-time of 1.5 ns has been developed. A pseudo-dual-port RAM function is achieved by a two-bank structure and on-chip control logic. Each bank can operate individually with different address synchronizing the single clock. A sense-amplifier with a selector function reduces the reading propagation time. Bonded SOI wafers reduce the memory-cell capacitance, and this results in a fast write cycle without sacrificing α-particle immunity. The chip is fabricated in a double polysilicon self-aligned bipolar process using trench isolation. The minimum emitter size is 0.5 × 2 μm^2 and the chip size is × 11mm^2.
- 社団法人電子情報通信学会の論文
- 1994-05-25
著者
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Usami M
Hitachi Ltd. Kokubunji‐shi Jpn
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Iwabuchi Masato
Device Development Center, Hitachi, Ltd.
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Usami Masami
Device Development Center, Hitachi, Ltd.
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Kashiyama Masamori
General Purpose Computer Division, Hitachi, Ltd.
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Oomori Takashi
General Purpose Computer Division, Hitachi, Ltd.
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Murata Shigeharu
Device Development Center, Hitachi, Ltd.
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Hiramoto Toshiro
Device Development Center, Hitachi, Ltd.
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Hashimoto Takashi
Device Development Center, Hitachi, Ltd.
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Nakajima Yasuhiro
Hitachi Computer Engineering Co., Ltd.
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Oomori Takashi
General Purpose Computer Division Hitachi Ltd.
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Iwabuchi Masato
Device Development Center Hitachi Ltd.
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Murata Shigeharu
Device Development Center Hitachi Ltd.
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Kashiyama Masamori
General Purpose Computer Division Hitachi Ltd.
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Nakajima Yasuhiro
Hitachi Computer Engineering Co. Ltd.
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Hashimoto Takashi
Device Development Center Hitachi Ltd.
関連論文
- A Bipolar-Based 0.5μm BiCMOS Technology on Bonded SOI for High-Speed LSIs (Special Section on High Speed and High Density Multi Functional LSI Memories)
- A 1.5-ns Cycle-Time 18-kb Pseudo-Dual-Port RAM with 9K Logic Gates (Special Section on the 1993 VLSI Circuits Symposium (Joint Issue with the IEEE Journal of Solid-State Circuits, Vol.29, No.4 April 1994))
- HCI-Free Selective Epitaxial SiGe Growth by LPCVD for 80-GHz BiCMOS Production
- Copper Wires for High Speed Logic LSI Prepared by Low Pressure Long Throw Sputtering Method
- New Test Structures for Evaluating the Scaling Limit of a Narrow U-Groove Isolation Structure (Special Issue on Microelectronic Test Structures)