半導体製造作業環境中のアルシン定量のための捕集条件の検討

概要

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Collecting conditions using various absorbing solutions were investigated for the determination of arsine in the working environment of semiconductor plants. Recommended procedure is as follows : the sample gas is collected by passing the gas through an impinger containing 20cm^3 of 2.0 w/v% potassium permanganate-0.6v/v% sulfuric acid solution at the flow rate of 1000cm^3 min^<-1> for 30min. The impinger comprises a bent-type gas dispersion tube sintered with a porous glass plate (20mm diameter, pore size 40〜100μm). Following the sampling, 10 cm^3 of 2.5w/v% hydrogen peroxide-0.6v/v% sulfuric acid solution is added to the absorbing solution in order to prevent the precipitation of manganese dioxide or to dissolve the precipitate already formed. Arsenic in the solution is then determined by flow injection/hydride generation-atomic absorption spectrometry according to the literature. The collection efficiency for arsine with 10 replicate determinations was 95±1% at the level of 31μgm^<-3>. Arsine in the working environment in the range of 8.7〜420μgm^<-3> can be determined with 30dm^3 of the sample gas using this procedure.
社団法人日本分析化学会の論文
1991-03-05