気相法によるSi_3N_4多孔体への微細Si_3N_4ウイスカーコーティングと炉過フィルターへの応用

概要

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Silicon nitride (Si_3N_4) whiskers were coated on a porous Si_3N_4 substrate, which was coated with SiO_2-Al_2O_3-Y_2O_3 oxides, by gas phase processing using amorphous Si_3N_4 and TiO_2 powders as source materials. Coating was carried out in the interval 1350-1550℃ in N_2. At temperatures below the melting point of the oxides, α-Si_3N_4 whiskers of high aspect ratio were coated with weak adhesion to the substrate. At temperatures above the melting point, β-Si_3N_4 whiskers with diameters of 0.02 to 0.07 μm (low aspect ratio) were coated with strong sdhesion to the substrate. When the Si_3N_4 substrates coated with the β-Si_3N_4 whiskers were used as membrane filters, it could separate particles as fine as 0.05 μm in diameter.
社団法人日本セラミックス協会の論文
1999-10-01