Optical Properties of Amorphous-Microcrystalline Mixed-Phase Si:H Films
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概要
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Amorphous-microcrystalline mixed-phase hydrogenated silicon (μc-Si : H) films have been prepared at a substrate temperature of 100℃ by glow discharge decomposition of mixed SiH_4/H_2 gas. We present the results of optical properties of these films as a function of silane fraction, i.e., optical gap energy, the characteristic energy representing the slope of the exponential tail of optical absorption coefficient and the refractive index in the infrared region and photoluminescence properties characterized by photoluminescence peak energy and the value of the full width at half maximum in photoluminescence spectra. It is also suggested from the light-induced effects in a-Si : H and μc-Si : H that those effects in photoluminescence is intimately associated with amorphous network.
- 社団法人日本物理学会の論文
- 1993-08-15
著者
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Yamaguchi Masaaki
Institute For Solid State Physics University Of Tokyo
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Morigaki Kazuo
Faculty Of Engineering Yamaguchi University
関連論文
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- Light-Induced Annealing of Dangling Bonds in a-Si:H
- Optical Absorption Spectra of Band-Edge Modulated a-Si_N_x:H Films
- Optical Properties of Amorphous-Microcrystalline Mixed-Phase Si:H Films
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