Electrical Breakdown Strength of Al_2O_3 Si_3N_4 and SiAlON Insulating Films Prpared by rf-magnetron Sputtering
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概要
著者
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Ando K
Toyota Technological Institute
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Ando K
Department Of Electrical And Electronic Engineering Tottori University
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Ando K
Department Of Electrical And Electronic Engineering Faculty Of Engineering Osaka Industrial Universi
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Aozasa M
Osaka City Univ.
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Nakayama Tadaaki
Department Of Electrical Engineering Faculty Of Engineering Osaka City University:(present Address)s
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Aozasa Masao
Department Of Physical Electronics And Information
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