<RESEARCH REPORT>Pinch Effect of the Ion Beam Pulse Propagating in a Plasma Channel
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概要
著者
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Kato Tomokazu
Department Of Applied Physics School Of Science And Engineering Waseda University
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Kato Tomokazu
Department Of Applied Physics Facullty Of Science And Engineering Waseda University
関連論文
- Stochastic Analysis of Anomalous Skin Effect for Linearly Polarized Intense Laser Light
- Aualysis of Propagation of an Intense and Short Laser Pulse in Inhomogeneous Plasmas
- Dynamics of Intense and Finite Length Ion Beam Propagating in Plasma Channel
- Azimuthal Current-Neutralization of a Rotational Light Ion Beam by a Plasma
- Formal Theory of Green Functions
- Kinetic Simulation of an Ion Acoustic Wave with Charge Exchange Process in Direct Current Discharge Plasma
- Chaotic reconnection due to fast mixing of vortex-current filaments
- Kinetic Simulation on Nonlinear Phenomenon of Ion Acoustic Wave in Gas Discharge Plasma with Convective Scheme
- Chaotic Reconnection Due to Fast Mixing of Vortex-Current Filaments
- Magnetic Fluctuations near the Relaxed State of RFP : Fluids, Plasmas, and Electric Discharges
- Low Frequency Fluctuations near Relaxed State of Reversed Field Pinch (RFP) in the Presence of Stationary Plasma Flow : Fluids, Plasmas, and Electric Discharges
- Thermodynamic Theory of Light Ion Beam Propagation in a Plasma
- Plasma Heating by a Relativistic Electron Beam. I. : Wave Kinetic Equation and Spectral Function
- Theory of Large-Amplitude Oscillations in a Plasma
- Nonlinear Damping of Electron Plasma Oscillations
- Theory of the Parametric Oscillation in an Electron Beam-Plasma System
- Theory of Excluded Volume Effect in a Chain Molecule Based on the Random Flights Model
- Pinch Effect of the Ion Beam Pulse Propagating in a Plasma Channel
- Theory of Excluded Volume Effect in Polymer Chains.
- On the Viscoelasticity and Complex Dielectric Constant in the Presence of an Electric Field and a Shearing Laminar Flow in Solution of Macromolecules
- Kinetic Simulation of an Ion Acoustic Wave with Charge Exchange Process in Direct Current Discharge Plasma