Channel Strain Measurement of Si_<1-x>C_x Structures : Effects of Gate Length, Source/Drain Length, and Source/Drain Elevation

Department Of Ceramic Engineering Yonsei University

Graduate School of EEWS, KAIST, Daejeon 305-701, Korea

Department of Materials Science and Engineering, Yonsei University, Seoul 120-749, Korea

Department of Materials Science and Engineering, Yonsei University, Seoul 120-749, Korea

Front End Products Group, Applied Materials Inc., Sunnyvale, CA 94085, U.S.A.

Graduate School of EEWS, KAIST

Department of Advanced Materials Science and Engineering, Sungkyunkwan University

Department of Materials Science and Engineering, Yonsei University

Front End Products Group, Applied Materials Inc.