Etching Characteristics of Fabricated Grooves on Silicon Solar Cell using Surface Discharge Plasma
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概要
- 論文の詳細を見る
A buried contact is one of effective techniques to improve the efficiency of solar cells. However, the etching of the patterned front contact on the surface of a solar cell is required. Therefore, we proposed a maskless etching technique using the surface discharge plasma operated at atmospheric pressure. The streamer-like discharge channels, which ignited near a triple junction point between the quartz glass layer, the solar cell, and the gas space, played an essential role in the etching. The etching rate of a silicon solar cell of which the surface had randomly distributed pyramid-like structures, was in the range of 3 - 5 μm /min when the applied voltage was 4.0 kV.
- 社団法人 電気学会の論文
- 2010-11-01
著者
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Sakoda Tatsuya
Department Of Electrical System And Computer Engineering Sojo University
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Hamada Toshiyuki
Department Of Materials And Infomatics Interdisciplinary Graduate School Of Agriculture And Engineer
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Hamada Toshiyuki
Department Of Cardiovascular Surgery Kanagawa Cardiovascular And Respiratory Center
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Sakoda Tatsuya
Department Of Electrical And Electronic Engineering Faculty Of Engineering University Of Miyazaki
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Sakoda Tatsuya
Department Of Electrical And Electronic Engineeringn Interdisciplinary Graduate School Of Agricultur
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Hamada Toshiyuki
Department Of Materials And Informatics Interdisciplinary Graduate School Of Agriculture And Enginee
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