Fabrication of Antireflective Subwavelength Structure on Spherical Glass Surface Using Imprinting Process
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概要
- 論文の詳細を見る
For the first time, an antireflective structure (ARS) on a convex spherical glass surface was fabricated using an imprinting process. The inverted pattern of the ARS with a 250-nm period was fabricated on a SiC mold with a concave surface using electron beam (EB) direct writing and reactive ion etching. The sample surface height was adjusted to the EB focal position along the mold curvature during the step-and-repeat EB lithography. The imprinted lens with the ARS exhibited surface reflectance of 0.2% at a wavelength of 530 nm and a spherical error magnitude of less than 500 nm.
- 2010-11-25
著者
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Nishii Junji
National Inst. Of Advanced Industrial Sci. And Technol.
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Kintaka Kenji
National Inst. Of Advanced Industrial Sci. And Technol.
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Kintaka Kenji
National Institute Of Advanced Industrial Science And Technology
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Nishii Junji
Research Institute For Electronic Science Hokkaido University
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Yamada Kazuhiro
Avc Networks Company Panasonic Corporation
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Tamura Takamasa
AVC Networks Company, Panasonic Corporation, Kadoma, Osaka 571-8504, Japan
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Umetani Makoto
AVC Networks Company, Panasonic Corporation, Kadoma, Osaka 571-8504, Japan
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Tanaka Yasuhiro
AVC Networks Company, Panasonic Corporation, Kadoma, Osaka 571-8504, Japan
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Kasa Haruya
Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021, Japan
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Kasa Haruya
Research Institute For Electronic Science Hokkaido University
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Umetani Makoto
Avc Networks Company Panasonic Corporation
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Tamura Takamasa
Avc Networks Company Panasonic Corporation
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Tanaka Yasuhiro
Avc Networks Company Panasonic Corporation
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