Glass Imprinting Process for Fabrication of Sub-Wavelength Periodic Structures
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概要
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Using direct glass imprinting with glassy carbon molds, one-dimensional surface-relief gratings with 500 nm pitch were fabricated on phosphate glasses. The maximum grating height attained in this study was 730 nm, which was formed by pressing at the softening temperature of the glass at a constant pressure of 0.4 kN/cm2. A large area pattern $6 \times 6$ mm2 with a 350-nm groove depth was also fabricated. Phase retardation of 0.1 $\lambda$ was attained between transverse electric (TE)- and transverse magnetic (TM)-polarized light in the visible wavelength region. Calculated retardation using a rigorous coupled wave analysis agreed well with the experimental results.
- 2008-06-25
著者
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Nishii Junji
National Inst. Of Advanced Industrial Sci. And Technol.
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Kintaka Kenji
National Inst. Of Advanced Industrial Sci. And Technol.
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Mori Toshiharu
Konica Minolta Opto Inc.
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KASA Haruya
National Institute of Advanced Industrial Science and Technology
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Nishii Junji
National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka 563-8577, Japan
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Mori Toshiharu
Konica Minolta Opto, Inc., Itami, Hyogo 664-8511, Japan
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Hasegawa Kento
Konica Minolta Opto, Inc., Itami, Hyogo 664-8511, Japan
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Hatano Takuji
Konica Minolta Opto, Inc., Itami, Hyogo 664-8511, Japan
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Kintaka Kenji
National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka 563-8577, Japan
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Kasa Haruya
National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka 563-8577, Japan
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