プラズマイオンプロセスシミュレーション

概要

論文の詳細を見る
Recent trend in simulation studies will be reviewed briefly in the field of plasma ion processes. In plasma ion processes, materials to be processed are immersed in a plasma. Since the sheath potential structure around the material surface is one of the key parameters governing the ion processes, emphasis will be put on the dynamics of transient ion sheath after a negative voltage is applied to the materials to be processed. After describing the concept of ion sheath, a one-dimensional model for ion sheath evolution is discussed. Both analytic and numerical models will then be introduced for more complicated realistic situations. Finally, a simulation model for plasma source, which will become one of the most important topics in control of plasma parameters for ion processes, will be discussed.
日本真空協会の論文
2008-02-20