Novel Ultra Clean Salicide Technology Using Double Titanium Deposited Silicide (DTD) Process for 0.1μm Gate Electrode
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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KAKIMOTO S.
Advanced Technology Research Laboratories, Sharp Corporation
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Kakimoto S.
Advanced Technology Research Laboratories Sharp Corporation
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Kotaki H.
Advanced Technology Research Laboratories Sharp Corporation
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NAKANO M.
Central Research Laboratories, Sharp Corporation
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KOTAKI H.
Central Research Laboratories, Sharp Corporation
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KATAOKA K.
Central Research Laboratories, Sharp Corporation
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KAKIMOTO S.
Central Research Laboratories, Sharp Corporation
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