Novel Ultra Thin Heavily Nitrided Gate Dielectrics Technology Adding Fluorine for Highly Reliable MOSFETs
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概要
- 論文の詳細を見る
- 1999-09-20
著者
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Morosawa N.
Advanced Technology Research Laboratories Sharp Corporation
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KOTAKI H.
Advanced Technology Research Laboratories, Sharp Corporation
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KAKIMOTO S.
Advanced Technology Research Laboratories, Sharp Corporation
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OHTA K.
Advanced Technology Research Laboratories, Sharp Corporation
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HASHIZUME N.
Advanced Technology Research Laboratories, Sharp Corporation
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Kakimoto S.
Advanced Technology Research Laboratories Sharp Corporation
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Kotaki H.
Advanced Technology Research Laboratories Sharp Corporation
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Hashizume N.
Advanced Technology Research Laboratories Sharp Corporation
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