Dual Focus Optical Head for 0.6mm and 1.2mm Disks
スポンサーリンク
概要
- 論文の詳細を見る
- 1994-11-01
著者
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Nishino Shigehiro
Department Of Electrical Engineering Technical College Kyoto Institute Of Technology
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Mizuno S
Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.
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KOMMA Yoshiaki
Materials and Devices Laboratory, Matsushita Electric Industrial Co., Ltd.
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NISHINO Seiji
Materials and Devices Laboratory, Matsushita Electric Industrial Co., Ltd.
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MIZUNO Sadao
Materials and Devices Laboratory, Matsushita Electric Industrial Co., Ltd.
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Nishino S
Kyoto Inst. Technol. Kyoto Jpn
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Nishino Seiji
Material And Device Laboratory Matsushita Electric Industrial Co. Ltd.
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Komma Y
Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Mizuno S
Aisin Seiki Co. Ltd. Aichi Jpn
関連論文
- Gas Desorption Analysis on the Surface of ZnO(0001^^-) after Hydrogen Ion Irradiation
- Compositional Change of Silicon Carbide Surface due to Oxygen Adsorption and Heat Treatment
- Deep Level Study in Heteroepitaxial 3C-SiC Grown on Si by Hexamethyldisilane : Electrical Properties of Condensed Matter
- Determination of Donor Densities and Donor Levels in 3C-SiC Grown from Si_2(CH_3)_6 Using Hall-Effect Measurements
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- Inner Area Aberration Compensating Lens for Compact Disc (Compact Disc-Recordable)-Digital Versatile Disc Compatible Head
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- Dual Focus Optical Head with a Hologram-Integrated Lens
- Dual Focus Optical Head for 0.6mm and 1.2mm Disks
- Site Occupancies of Sr and Ca Ions in Bi_2(Sr_Ca_x)_3Cu_2O_y Studied by Photoemission Core-Level Spectroscopy
- Application of a Polarizing Holographic Optical Element to a Recordable Optical Head
- Fabrication of P-N Junction Diodes Using Homoepitaxially Grown 6H-SiC at Low Temperature by Chemical Vapor Deposition
- Bias-enhanced Nucleation of Oriented Diamond on Singlecrystalline 6H-SiC Substrates
- Diamond Nucleation on Singlecrystalline 6H-SiC Substrates by Bias-Enhanced Nucleation in Hot Filament Chemical Vapor Deposition
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- Plasma Copolymerization of Tetratluoroethylene/Hexamethyldisiloxane and In Situ Fourier Transform Infrared Spectroscopy of Its Gas Phase
- Plasma Etching of CVD Grown Cubic SiC Single Crystals
- Metal-Oxide-Semiconductor Characteristics of Chemical Vapor Deposited Cubic-SiC