Pulsed Laser Deposition of Ferroelectric (Na0.5K0.5)NbO3-Based Thin Films
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概要
- 論文の詳細を見る
Ferroelectric (Na0.52K0.44Li0.04)(Nb0.84Ta0.10Sb0.06)O3 thin films were epitaxially grown on a (100)SrRuO3$\parallel$(100)SrTiO3 substrate by pulsed laser deposition. Crystallographic analysis of the film was performed using conventional X-ray diffraction analysis and rocking curve measurements. High resolution X-ray diffraction reciprocal space map was also measured to analyze the crystallographic relationship between the grown film and the SrTiO3 substrate and to determine the strain state of the film. The full width at half maximum of the rocking curve was as small as 0.19° and the determined pseudo-tetragonal lattice parameters were $a=3.947$ Å and $c=3.955$ Å. The $P$–$E$ hysteresis loop of the film was characteristic of ferroelectric behavior.
- Japan Society of Applied Physicsの論文
- 2005-04-10
著者
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Saito Takehisa
Department Of Materials Chemistry Ryukoku University
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Wada Takahiro
Department Of Intelligent Mechanical Systems Faculty Of Engineering Kagawa University
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Adachi Harumi
Department of Materials Chemistry, Ryukoku University, Seta, Otsu 520-2194, Japan
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Adachi Harumi
Department Of Materials Chemistry Ryukoku University
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Wada Takahiro
Department of Chemistry, Tokyo Metropolitan University
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