マイクロフォーカスX線検査装置用Niグリッドマスクの開発

概要

論文の詳細を見る
A Microfocus X-ray inspection apparatus requires a grid mask as a scale which gives an indication of distortion correction and magnification. In addition, a grid mask must be an X-ray absorber. A thick micro structure is available to an X-ray absorber. Ni which is a typical electroforming material has a vocation for a thick micro structure. In this study, we make use of Ni micro structure 40μm thick as X-ray absorber. We fabricated the Ni grid mask using LIGA-like process. When the X-ray tube voltage was 70kV, we could observe the plain gird through an IC chip. Additionally, the center distance of the grid was to within an average of ±1μm in both the lengthwise direction and crosswise direction. These results suggest a Ni micro-structure is available as the position indicator for a Microfocus X - ray Inspection Systems.
社団法人電気学会の論文
2005-04-01