Morphological Evolution of Grain-Boundary SiO_2 in Internally Oxidized Cu-Si Bicrystals
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2004-03-20
著者
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SATO Hisashi
Department of Techno-Business Administration Graduate School of Engineering, Nagoya Institute of Tec
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藤居 俊之
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Fujii Toshiyuki
Department Of Pathology Kansai Medical University:pharmacology Division National Cancer Research Ins
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Kato M
Department Of Materials Science And Engineering Tokyo Institute Of Technology
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KATO Masaharu
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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ONAKA Susumu
Department of Materials Science and Engineering, Tokyo Institute of Technology
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OTA Ibuki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Ota Ibuki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Sato Hisashi
Department Of Information And Computer Sciences Faculty Of Engineering Saitama University
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Sato Hisashi
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Onaka S
Department Of Materials Science And Engineering Tokyo Institute Of Technology
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Onaka Susumu
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Fujii Toshiyuki
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Kato Masaharu
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Onaka Susumu
Department of Engineering Science, Faculty of Engineering, Kyoto University
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