Tantalum Nitride Interface Layer Influence on Dielectric Properties of Hafnium Doped Tantalum Oxide High Dielectric Constant Thin Films
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2003-07-01
著者
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Lu Jiang
Thin Film Microelectronics Research Laboratory Department Of Chemical Engineering Texas A&m Univ
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KUO Yue
Thin Film Microelectronics Research Laboratory, Department of Chemical Engineering, Texas A&M Univer
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TEWG Jun-Yen
Thin Film Microelectronics Research Laboratory, Department of Chemical Engineering, Texas A&M Univer
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Kuo Yue
Thin Film Microelectronics Research Laboratory Department Of Chemical Engineering Texas A&m Univ
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Kuo Yue
Thin Film Microelectronics Research Laboratory Department Of Chemical Engineering Texas A&m Univ
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Tewg Jun-yen
Thin Film Microelectronics Research Laboratory Department Of Chemical Engineering Texas A&m Univ
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