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the Graduate School at Nagatsuta, Tokyo Institute of Technology | 論文
- Sm^ Photoluminescence and X-Ray Scattering Studies of A- and B-Type Epitaxial CaF_2 Layers on Si(111)
- VERTICAL OSCILLATION OF EARTH AND ROCKFILL DAMS : ANALYSIS AND FIELD OBSERVATION
- Dynamic Deformation and Failure Characteristics of Rockfill Material Subjected to Cyclic Shear Loading under Vertical Vibration〔に対する討論〕
- Hole Transport in Silicon Thin Films with Variable Hydrogen Content
- Preparation of Polycrystalline Silicon by Hydrogen-Radical-Enhanced Chemical Vapor Deposition
- Hole Transport in a-Si:H(F) Prepared by Hydrogen-Radical-Assisted Chemical Vapor Deposition
- Preparation of Highly Photoconductive a-SiGe_x from Fluorides by Controlling Reactions with Atomic Hydrogen
- Designing New Materials with Amorphous Semiconductors : Structure and Electrical Properties of Multiply Stacked a-Si/a-SiGe_x Layers
- The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
- Highly Oriented ZnO Films Prepared by MOCVD from Diethylzinc and Alcohols
- Efficient Electrochemical Reduction of N_2 to NH_3 Catalyzed by Lithium
- Hydrogenation of Solid State Carbonates
- Fabrication of Polycrystalline Silicon Films from SiF_4/H_2/SiH_4 Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties.
- Comparison of Microstructure and Crystal Structure of Polycrystalline Silicon Exhibiting Varied Textures Fabricated by Microwave and Very High Frequency Plasma Enhanced Chemical Vapor Deposition and Their Transport Properties
- Optimum Ultrasonic Imagine System Using ARMA Processing : Medical Ultrasonics
- Detection of Radar Targets by means of Fractal Error
- Detection of Targets Embedded in Sea Ice Clutter by means of MMW Radar Based on Fractal Dimensions,Wavelets, and Neural Classifiers (Special Issue on Millimeter-wave Short-range Application Systems Technology)
- Role of Seed Crystal Layer in Two-Step-Growth Procedure for Low Temperature Growth of Polycrystalline Silicon Thin Film from SiF_4 by a Remote-Type Microwave Plasma Enhanced Chemieal Vapor Deposition
- Preparation and Properties of (ZnS)_3(ZnSe)_ Ordered Alloys Fabricated by Plasma-Enhanced Low-Temperature Growth Technique ( Plasma Processing)
- Structures and Properties of (ZnS)_n(ZnSe)_m(n=1-4) Ordered Alloys Grown by Atomic Layer Epitaxy