スポンサーリンク
o NTT LSI Laboratories | 論文
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Evaluation of Image Shortening for Rectangular Array Patterns in X-Ray Lithography
- Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas
- Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
- Performance of X-Ray Stepper for Next-Generation Lithography
- Studies on Defect Inspectability and Printability Using Programmed-Defect X-Ray Mask
- Proximity Effect Correction for 1:1 X-Ray Mask Fabrication
- Sputtered W-Ti Film for X-Ray Mask Absorber
- Fabrication of Diamond Membranes for X-Ray Masks by Hot-Filament Method
- Electron Beam Writing Techniques for Fabricating Highly Accurate X-Ray Masks
- Improvement of Pattern and Position Accuracies by Multiple Electron Beam Writing for X-Ray Mask Fabrication
- Characterization of Solid Oxide Fuel Cell Components by Gas Permeability Measurement