Evaluation of Image Shortening for Rectangular Array Patterns in X-Ray Lithography
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
-
Tanaka Yuusuke
O Ntt Lsi Laboratories
-
MITSUI Soichiro
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies (ASET),
-
TAGUCHI Takao
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies (ASET),
-
GOMEI Yoshio
o NTT LSI Laboratories
-
HISATSUGU Tokushige
Super-fine SR Lithography Laboratory, Association of Super-Advanced Electronics Technologies (ASET),
-
Taguchi Takao
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies (aset) C
-
Mitsui Soichiro
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies (aset) C
-
Hisatsugu Tokushige
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies (aset)
-
Hisatsugu Tokushige
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies (aset) C
関連論文
- Evaluation of Image Shortening for Rectangular Array Patterns in X-Ray Lithography
- Evaluation of Overlay Accuracy for 100-nm Ground Rule in Proximity X-Ray Lithography
- Design of Beamline Optics for Large-Field Exposure