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Ulsi Development Center Mitsubishi Electric Corporation | 論文
- Reduction of Charge Build-Up with Pulse-Modulated Bias in Pulsed Electron Cyclotron Resonance Plasma
- Clarification of Nitridation Effect on Oxide Formation Methods
- Impact of Nitrogen Implantation on Highly Reliable Sub-Quarter-Micron Metal Oxide Field-Effect Transistors (MOSFETs) with Lightly Doped Drain Structure
- Substrate Engineering for Reduction of Alpha-Particle-Induced Charge Collection Efficiency
- High-Speed SOI 1/8 Frequency Divider Using Field-Shield Body-Fixed Structure
- Kikuchi-Band Analysis of X-Ray Photoelectron Diffraction Fine Structure of Si(100) by Precise Angle-Resolved X-Ray Photoelectron Spectroscopy