Kikuchi-Band Analysis of X-Ray Photoelectron Diffraction Fine Structure of Si(100) by Precise Angle-Resolved X-Ray Photoelectron Spectroscopy

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概要

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• X-ray photoelectron diffraction fine structure of Si(100) is studied with precise angle-resolved X-ray photoelectron spectroscopy. Polar-angle intensity distributions of the Si 2p photoelectron emission excited by Al Kα X-rays are measured from H-terminated Si(100) along some azimuthal angles, and are qualitatively interpreted using both forward-focusing peaks along zone axes and Kikuchi bands associated with planes of low indices ({220}, {400}, {111} and {311}). To confirm the interpretation experimentally, we prepare ultrathin Si(100) layers on SiO2 from silicon-on-insulator (SOI) wafers. The thicknesses of the ultrathin Si(100) layers are adjusted so that the SOI layer is thick enough to exhibit the forward-focusing peak along [100] but slightly thinner than the thickness in which the contribution of the Kikuchi pattern weakens. It is observed experimentally, for the first time, that the intensities of X-ray photoelectron diffraction fine structure due to Kikuchi lines decreases for such ultrathin Si(100), while the forward-focusing peak remains unchanged, as expected from our interpretation.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1999-03-15

著者

• Umeno Masataka

  Graduate School Of Engineering Osaka University

• Mashiko Yoji

  Ulsi Development Center Mitsubishi Electric Corp

• Yamamoto Hidekazu

  Ulsi Development Center Mitsubishi Electric Corporation

• Koyama Hiroshi

  Ulsi Development Center Mitsubishi Electric Corporation:(present Address)jeol Limited

• Kawazu Satoru

  Department of Electronic and Photonic Systems Engineering, Kochi University of Technology, Tosayamada, Kochi 782-0003, Japan

• Katayama Toshiharu

  ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan

• Umeno Masataka

  Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

• Koyama Hiroshi

  ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan

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