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Tri Chemical Laboratory Inc. | 論文
- Effect of Phosphorus Atom in Self-Assembled Monolayer as a Drift Barrier for Advanced Copper Interconnects
- ポリアニリンによる2,5-ジメルカプト-1,3,4-チアジアゾールの電気化学触媒的酸化反応-1.ポリアニリンモデル化合物としてのN,N'-ジフェニル-p-フェニレンジアミンの利用
- Fabrication of Refractive Index Profiles in Poly (Methyl Methacrylate) using Ultraviolet Rays Irradiation
- Low Carbon Incorporation in Metalorganic Molecular Beam Epitaxy of GaAs Using Dimethylamine Gallane
- Growth Condition Dependence of Carbon Reduction in GaAs Chemical Beam Epitaxy Using Trisdimethylamimo-Arsine and Trimethylgallium
- Composition Control of Ni Silicide by Chemical Vapor Deposition Using Ni(PF3)4 and Si3H8
- Composition control of Ni-silicide by CVD using Ni(PF_3)_4 and Si_3H_8
- Ni Thin Film Deposition from Tetrakistrifluorophosphine-Nickel
- Vapor Pressure of Hf and Si Precursors for Hf_xSi_O_2 Deposition Evaluated by a Saturated Gas Technique
- Synthesis of Novel Sr Sources for Metalorganic Chemical Vapor Deposition of SrTiO_3 ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Superiority of an AlN Intermediate Layer for Heteroepitaxy of Hexagonal GaN