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Toppan Printing Co., Lid. | 論文

• X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress Effect
• Reduction of X-Ray Irradiation-Induced Pattern Displacement of SiN Membranes Usirng H^+ Ion Implantation Technique
• Improvement in Radiation Stability of SiN X-Ray Mask Membranes
• Optically High Transparent SiN Mask Membrane with Low Stress Deposited by Low Pressure Chemical Vapor Deposition
• Charge Build-Up in Magnetron-Enhanced Reactive Ion Etching : Etching
• Charge Build-Up in Magnetron-Enhanced Reactive Ion Etching

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