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Tokyo Ohka Kogyo Co. Ltd. | 論文
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- Proton Dynamics in Chemically Amplified Electron Beam Resists
- Room-Temperature Nanoimprinting Using Ladder Hydrogen Silsesquioxane
- Investigation of Interfaces between Insulator and Active Layer, and between Active Layer and Electrodes in n-Type Organic Field-Effect Transistors
- Effect of Hydroxyl Group of Polymer Gate Insulators on Characteristics of Dihexylsexithiophene Organic Field-Effect Transistors Using Poly(p-silsesquioxane) Derivatives
- Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness
- Supercritical Improvement of Resist Patterns by Introducing Functional Molecules