スポンサーリンク
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan | 論文
- Electrical Heating Process for p-Type to n-Type Conversion of Carbon Nanotube Field Effect Transistors
- High-Resolution Scanning Tunneling Microscopy and Spectroscopy Studies of Deoxyribonucleic Acid and Fluorescein Isothiocyanate
- Formation of Two Dimensional Network Structure of DNA Molecules on Highly Ordered Pyrolytic Graphite Surface
- Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists
- Atomic Force Microscopy Observation of Stretched DNA on Graphite Surfaces
- Experimental Studies of Transverse and Longitudinal Beam Dynamics in Photoinjector
- Radiation Chemistry in Chemically Amplified Resists
- Spinodal Decomposition under Layer by Layer Growth Condition and High Curie Temperature Quasi-One-Dimensional Nano-Structure in Dilute Magnetic Semiconductors
- Computational Nano-materials Design for Colossal Thermoelectric-cooling Power by Adiabatic Spin-Entropy Expansion in Nano-superstructures
- Correlation between $C_{37}$ Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam
- Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation
- Current Injection Laser Operation of GaAs/InAs Short-Period Superlattice/InP(411) Quantum Dot Laser Diodes with InAlAs Current Blocking Layer
- Aligned Single-Walled Carbon Nanotube Arrays on Patterned SiO2/Si Substrates
- Current Injection Laser Oscillation in TlInGaAs/GaAs Double Quantum Well Diodes with InGaP Cladding Layers
- Atomic Force Microscopy Observation of Deoxyribonucleic Acid Stretched and Anchored onto Aluminum Electrodes
- Quantum Yield of Electron-Beam Induced Decomposition of SiO2 Overlay on Si in Nanolithography Using a Scanning Tunneling Microscope
- High-Absorption Resist Process for Extreme Ultraviolet Lithography
- Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists