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The Institute of Scientific and Industrial Research, Ôsaka University | 論文
- Antiulcer Agents. III. Synthesis and Antiulcer Activity of N-[3-(3-Piperidinomethylphenoxy)propyl]pentacyclo[4.2.0.0^.0^.0^]-octane Carboxamides and Related Compounds
- Reaction of 4-(N, N-Dimethylamino)-2-phenyl-2-(2-pyridyl)butanenitrile and Related Compounds with Ethyl Chloroformate; Formation of Indolizinium and Quinolizinium Chlorides
- Smiles Rearrangement of 2-(1-Methyl-1H-tetrazol-5-ylthio)acetamides and Their Sulfonyl Derivatives
- Antiulcer Agents. II. Synthesis and Gastric Acid Antisecretory Activity of N-[3-{3-(Piperidinomethyl)phenoxy}propyl]-4-(1-methyl-1H-tetrazol-5-ylthio)butanamide and Related Compounds
- Synthesis and Pharmacological Properties of N-[3-{3-(1-Piperidinylmethyl)phenoxy}propyl]-2-(2-hydroxyethylthio)acetamide and Related Compounds as Antiulcer Agents.I
- Surface Analysis of YBa_2Cu_3O_x and Bi-Sr-Ca-Cu-O Superconductors by Auger Electron Spectroscopy
- Hard X-ray Photoemission Spectroscopy Combined with Magnetic Circular Dichroism : Application to Fe_Zn_xO_4 Spinel Oxide Thin Films
- Application of Chemical Imaging Sensor to Electro Generated pH Distribution
- Visualization of pH Change of E. coli with a Novel pH Imaging Microscope
- Observation of Microorganisms Colonies Using a Scanning-Laser-Beam pH-Sensing Microscope
- Improvememt of Spatial Resolution of a Laser-Scanning pH-Imaging Sensor
- Anisotropic Waves Propagating on Two-Dimensional Arrays of Belousov-Zhabotinsky Oscillators
- Simulation of Light Scattering by a Particle on a Film-Coated Substrate Using Coupled-Dipole Method
- Light Scattering by Submicron Particles on Film-Coated Wafers
- Redox Potential Imaging Sensor
- Enhanced Nano-Oxidation on a SCi-Treated Si Surface Using Atomic Force Microscopy
- Nanotribology of Clean and Oxide-Covered Silicon Surfaces Using Atomic Force Microscopy
- Fabrication of Nanopit Arrays on Si (111)
- Scanning Tunneling Microscopy Study of the Misfit Layer Compounds (LaSe)_xNbSe_2 and (PbSe)_xNbSe_2
- Scaling Analysis of SiO_2/Si Interface Roughness by Atomic Force Microscopy