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The Graduate School At Nagatsuta Tokyo Institute Of Technology:(present Address) Saitama University | 論文
- The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
- Study on Chemical Reactions on the Growing Surface to Control the Structures of μc-Silicon from Fluorinated Precursors
- Improvement of Photoluminescence Properties of ZnSe Film Grown by Hydrogen Radical-Enhanced Chemical Vapor Deposition Using Alternate Gas Supply and Substrate Bias Application
- Very Stable a-Si:H Prepared by "Chemical Annealing"
- Narrow Band-Gap a-Si:H with Improved Minority Carrier-Transport Prepared by Chemical Annealing
- Coherent Growth of ZnSe Thin Film at Low Growth Temperature by Hydrogen Radical Enhanced Chemical Vapor Deposition
- Preparation of μc-Si:H/a-Si:H Multilayers and Their Optoelectric Properties
- Silicon-Hydrogen (SiH_n, (n,=1, 2, 3)) Bonding Configurations in Very Thin Hydrogenated Amorphous Silicon Films Deposited on Various Kinds of Substrates under Different SiH_4 Dilution Conditions